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ASM Epsilon 2000 Epi Reactor Model 26
 

 

SYSTEM CONFIGURATION

The ASM Epsilon 2000 epitaxial reactor is a stand-alone, single-wafer system. ASM designed the system for repeatable deposition of uniform, premium quality, epitaxial silicon and related processing, such as selective silicon and silicon germanium deposition. The system includes a reactor module, gas control module, power module and an engineering console. Users can arrange these various modules to fit several layouts. For example, the power module and the engineering console include a standard 25 feet (7.6 meters) interconnect wiring harness from the reactor module. They can be located anywhere within the reach of this harness.

To further enhance system layout flexibility, ASM manufactures the reactor and attached gas control module in left or right-hand versions. When facing the reactor's clean-room front, the "hand" of the reactor is the side with maintenance access doors. Users of multiple Epsilon 2000 systems can place two systems back to back to minimize gray-room space.

SYSTEM DESCRIPTION & OPTIONS

1.0 Single Wafer Epitaxy System

REACTOR MODULE

  • Model RP for reduced pressure processing and ATM processing
  • Vacuum load locks (scroll pump not included)
  • Clean-room front with color touch screen operator interface
  • Two independent wafer cassette load locks
  • Right-hand maintenance access configuration
  • Automated wafer handling section with Bernoulli wand
  • VAT reactor gate valve
  • Maintenance access=2 0port in wafer handling chamber
  • Epitaxy process chamber (existing), susceptor (new) and related quartzware (new) for 200mm wafer processing
  • Toshiba graphite - square
  • Observation windows on maintenance access doors in wafer handling & process chamber sections
  • 68040-based computer, operating system and software with 4.3 Gbyte hard disk drive
  • Multiport Injector Flange with water cooling circuit
  • Vibration Isolation Package
  • HCl detector reactor module
  • Adjustable Spot Lamps
GAS CONTROL MODULE
  • Orbital welded 316L stainless steel, electropolished interior surface tubing
  • Line and component connections via metal-gasketed fittings
  • .003 micron point-of-use filtration
  • AERA mass flow controllers model 7810/7820
  • Gas sampling ports
  • Gas Loops:
    • Nitrogen (N2) purge
    • Hydrogen (H2) carrier and purge
    • Hydrogen chloride (HCl) wafer and chamber etch
    • Dopant #1, diborane (B2H6) P-dopant, diluent and inject
    • Do pant #2, phosphine (PH3) or arsine (AsH3) N-dopant, diluent and inject
    • Low flow hydrogen chloride (HCl)
    • Auxiliary silicon source, dichlorosilane (SiH2Cl2, gas)
    • Auxiliary loop for TCS with MFC and Lorex Piezocon controller
  • Advanced application valving (for multilayer sharp-transition processing)
  • HCl detector gas module
  • Precision Vent Matching
POWER MODULE
  • Single point, 3-phase, 60 Hz, 480 VAC power input
  • Lamp array SCR packs
  • 110 VAC/24 VAC power distribution circuits
  • Power and load protection devices
  • 0 ft. (15.2m) of interconnect wiring harness for remote operation
ENGINEERING CONSOLE
  • Color touch screen operator interface (allows for operation of system from gray room)
  • Operator key lock control
  • Temperature control digital electronics
  • 50 ft. (7.6m) of interconnect wiring harness for remote operation
SOURCE CABINET WITH MINI-BUBBLER
  • 10-liter mini-bubbler
  • H2 Detector
  • HCl detector
  • TCS/DCS
System Documentation