About Us

New Equipment


AMAT P5000
AMAT Spare Parts
-Dispatch Conveyor
       Furnace Model
-ASM Epsilon 2000
       Epi Reactor
-Alcatel DRIE
-Dispatch Conveyor
       Furnace Model
-Schmid Light
       Induced Plater (LIP)
-SELA Sample Prep
       for Failure Analysis
       for SEM and TEM
-EEJA (Electro Plating
       -Engineers of
        Japan) Ni and
        Ag Plating
-Schmid Light
       Induced Plater (LIP)
-EVG101 Coater
-Thermco Maxibrute
       200mm Oxidation
-Spare Parts
-Wet Process

Contact Us




Conquer Industries strives to provide quality pre-owned equipment at reasonable prices. Below is a sampling from our current inventory. Of course, many other types of equipment are available, please call us to discuss these systems, or any other equipment needs you may have.

Temescal FC3200 Operational Call for pricing
  PLC/PC controlled
32 S/S water cooled chamber
2ea 2 Temescal e-gun
CTI CryoTorr 400 and compressor
2ea Telemark TT6 power supply
1ea 5KW thermal source
Granville Phillips ion gauge controller
Dual ion gauge tubes
Convectron gauge controller
Leybold D-30 mechanical pump
Variable speed planetary
Flat planets for 4 wafers
Other planetary available

90 day warranty
CHA SE1000 Evaporator Call for pricing
  Completely Rebuilt, Turnkey System
Diffusion Pump
LN2 Trap
25 x 30 Stainless Steel Bell Jar
Auto Valve Control
Ion with 2 Thermocouple Control
Mechanical Pump
Motorized Hoist System
Quartz Deposition Controller
Substrate Rotation Motor and Contro
LN2 Control
Veeco VE400 Evaporator Call for pricing
  • Veeco VE400 Evaporator in custom frame
  • Varian 4" diffusion pump
  • Welch 1397 Mechanical pump
  • Right angle hi-vac valve
  • 18" X 12" Pyrex bell jar
  • Aluminum collar and lid
  • 8 each 2 " conflate flanges
  • Liquid Nitrogen Coldfinger style trap
  • Motorized hoist
  • Previously used for gold evaporation
  • Manual valves
  Stainless steel bell jar, powered hoist with planetary rotation motor. Diffusion pumped manual system with DW Industry Power Supply Model 5024. All CHA displays and control systems, 50mm planetary included.

Operational when professionally decommissioned in August of 2005.

Tegal Plasma In Line Model 803 CALL FOR PRICE
  Decommissioned in operational condition in 2005. Includes built in chart recorder, digital controls, RF generator hoook up
  • Automatic Plasma Etcher;
  • Microprocessor based plasma chemistry etcher;
  • Designed especially for the etching of silicon dioxide thin film deposited on single crystal or polysilicon semiconductor wafers;
  • Provides up to four process gasses;
  • Provides up to two process channels and a clean channel;
  • Includes RF generator;
  • Digital Control System;

Davis and Wilder (D&W) Resistive (thermal) Evaporation System (NEW ITEM) CALL FOR PRICE
  System Description: Davis and Wilder (D&W) Resistive (thermal) Evaporation System. This will be a fully operational system, with the following features and support equipment. System is exact system represented in images.

Frame- 48" W X 34" D footprint
25" O ring seal, stainless steel bell jar with two viewports.
CTI 8 Cryopump.
CTI compressor.
CTI temperature monitor.
Pneumatic stainless steel gate valve
SS pneumatic roughing, regeneration and associated manifolding.
5KVA SCR control panel with manual Maxtek switch and digital current readout.
HD 600V 3 boat tap switch.
HSD valve sequencer/auto cryogenic regeneration.
Granville Phillips 340 Ion/convectron Gauge.
Maxtek MDC 360 film thickness controller with remote control.
Maxtek dual crystal head.
Sites for three typical configuration thermal evaporation boats with source shutter
Single 6" substrate H2O cooled static stage (height, angle and offset adjustable) with shielded thermocouple temperature indication.
Quartz Halogen substrate heater with digital temperature controller.
Leybold D30 mechanical pump.
Manuals and schematics binder detailing equipment. (as available).

Statement of Work:

1. Shielding will be professionally chemically cleaned.
2. All mechanical assemblies and sub-assemblies will be inspected for damage or wear, and repaired or replaced as necessary.
4. All existing electrical wiring will be inspected and replaced as necessary in system chassis.
5. System will be Helium Mass Spectrometer leak tested.
6. Full functional test of system performance for a period of 3 days prior to customer inspection.
7. Customer can receive system operation and maintenance training at vendor facility during final inspection at no additional cost to customer.

Warranty: All OEM warranties are in passed on to customer. 6 months parts and labor on vacuum system and electronic devices. T.E.C. must receive timely notification of system malfunction, and be provided the opportunity to evaluate system prior to any repair attempts by the customer.

Delivery: 7-10 weeks from receipt of hard copy purchase order and down payment. Functional testing, acceptance sign-off and delivery may be subject to change without penalty to vendor in the event of delays in receiving OEM components.

NOTE: Vendor agrees to notify customer immediately, in the event of any delay due to equipment availability from its suppliers.

Shipping: FOB Northern California

The system outlined is subject to prior sale.


Nordiko 8550 Sputtering System CALL FOR PRICE
  • 4 target sputtering system
  • Load Lock chamber
  • Cryo pumped, C2C
  • Sputter down configuration
  • 4 each RF Matching units
  • 4 each RF Cathodes
  • 4 each 200mm cathodes
  • RFPP RF Generator for targets
  • 2 each RFPP Power supplies
  • Substrate Heat Option Included
  • 3 Process gasses: Argon: 200 SCCM; N2 20 SCCM; O2 20 SCCM
  • CTI CT-8 Cryo pump with CTI 8200 Compressor
  • Edwards vacuum pump
  • SPECTRA Vascan Plus RGA, Digital - Excellent condition with Balzers turbo pump and controller included
  • Eurotherm Substrate Temperature Control
  • Balzers TPH-340 Turbo Pump Load Lock
Spare parts include
  • 200mm round backing plate(s): Cu
  • 200mm round cathodes
  • More in boxes to be opened

  • High sputtering rates
  • Low substrate temperature during sputtering
  • Excellent layer thickness uniformity resulting from variable cathode to substrate spacing and symmetrical arrangement of the sputtering chamber
  • High throughput: 10 substrates, 3 dia
  • Processes
    • RF-etching
    • RF-sputtering
    • RF-bias-sputtering
  • Sputtering chamber is easily accessible
  • Microprocessor controlled
  • Turbo pumped
System Design
The 590-mm diameter vacuum chamber incorporates: Turbo pumped Baffles for presputtering and sputter-etching, Water-cooled substrate carrier, and Substrate mounting plate.

In addition, the A550 VZK includes RF power supplies (IS 7.5 for sputtering), and TIS 1.2 for sputter-etching and bias sputtering, automatically adapted impedance matching networks, and an equipment rack holding the central control computer.

System design and Operation
The relatively low chamber volume allows extremely short pumpdown times. The separation between substrates and target is optimized for the attainment of stable, homogeneous, film distributions.